High aspect ratio silicon ring-shape micropillars fabricated by deep reactive ion etching with sacrificial structures - ScienceDirect

Description

Direct etching results of arrays of vertical silicon (100

PDF] An advanced reactive ion etching process for very high aspect

Enhanced metal assisted etching method for high aspect ratio

Micromachines, Free Full-Text

Enhanced metal assisted etching method for high aspect ratio

High aspect ratio silicon and polyimide nanopillars by combination

Micro‐/Nanopillars for Micro‐ and Nanotechnologies Using

Figure 1 from Ultra Deep Reactive Ion Etching of High Aspect-Ratio

Micromachines, Free Full-Text

Heterogeneous optoelectronic characteristics of Si micropillar arrays fabricated by metal-assisted chemical etching

$ 6.99USD
Score 4.9(458)
In stock
Continue to book